| 摘要 |
Disclosed is an arcing preventing structure of a far-infrared radiation surface type heater terminal for a vacuum device for manufacturing a semiconductor or a display used under a vacuum condition. The arcing preventing structure is used under the vacuum condition by applied to the vacuum device for manufacturing a semiconductor or a display. The arcing preventing structure has an effect of preventing arching, on the far-infrared radiation surface type heater terminal for the vacuum device for manufacturing the semiconductor or display, which used to occur when a cable connection part gets close to other parts of a heating wire by arranging the cable connection part on a straight line with the heating wire and a heating wire connection part. |
