发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>A semiconductor device (100) is provided with: a semiconductor base body (1); a first conductivity-type drift region (2), which has a trench in a part of an upper portion thereof, and which is disposed on a first main surface of the semiconductor base body (100); a second conductivity-type electric field relaxing region (4) that is disposed, at the bottom of the trench, merely on the areas at the periphery of the corner portions, said areas excluding a center portion at the bottom; an anode electrode (9) embedded in the trench; and a cathode electrode (10) that is disposed on a second main surface of the semiconductor base body (100), said second main surface facing the first main surface.</p>
申请公布号 WO2014061724(A1) 申请公布日期 2014.04.24
申请号 WO2013JP78145 申请日期 2013.10.17
申请人 NISSAN MOTOR CO., LTD. 发明人 MARUI, TOSHIHARU;HAYASHI, TETSUYA;YAMAGAMI, SHIGEHARU;NI, WEI;EMORI, KENTA
分类号 H01L29/861;H01L29/06;H01L29/47;H01L29/868;H01L29/872 主分类号 H01L29/861
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