| 摘要 |
The lithography apparatus forms a pattern on a substrate, comprising a holder configured to hold an original or the substrate, and to be moved, an interferometer configured to measure a position of the holder in a measurement direction which intersects with the upper plane of the holder, a reference member provided on the upper plane and having a reference plane, a measuring device provided so as to face the reference plane and configured to measure a position of the reference plane in the measurement direction, and a controller configured to obtain correction data for correcting a measured value obtained by the interferometer based on the measured value obtained by the interferometer and a measured value obtained by the measuring device. |
