| 摘要 |
<p>The present invention relates to an apparatus for supplying a photoresist liquid which removes microbubbles and stably supplies a photoresist liquid when a photoresist liquid used in photolithography is supplied during the manufacture of a semiconductor or a liquid crystal substrate. The apparatus for supplying a photoresist liquid according to the present invention comprises: a portable container for conveying a photoresist liquid; an intermediate container for receiving, from the portable container, the photoresist liquid by using pressure of inert gas through a liquid conveyance pipe, and supplying the photoresist liquid to be processed; a buffer tank which is connected to the intermediate container through a first pipe, and connected to the portable container through a second pipe; a vacuum generator which is installed in the first pipe, and moves mircobubbles inside the intermediate container to the buffer tank by using vacuum pressure (negative pressure); and an air valve which is installed in the second pipe, and is opened and closed to collect inert gas among microbubbles moved to the buffer tank in the portable container. [Reference numerals] (AA) Exhaust; (BB) Air vent; (CC) External process</p> |
