发明名称 EXPOSURE APPARATUS
摘要 <p>The present invention relates to an exposure apparatus for separately classifying a mask and an exposure target in the position alignment of the mask and exposure target and clearly recognizing an alignment mark and, more specifically, to an exposure apparatus which contains a mask holder for holding a mask, a mask holder movement part for moving the mask holder and a stage part for moving an exposure target. The exposure apparatus comprises: a camera part which observes an alignment mark formed on the mask, and an alignment mark formed on the exposure target, receives images and convers the images into image data; a mark position detection part which respectively extracts features from the image data of the alignment mark of the exposure target, and the image data of the alignment mark of the mask; and a control part which stores the image data pf the alignment mark of the mask converted in the camera part, receives the image data of the alignment mark of the exposure target from the camera part, inputs the image data of the alignment mark of the exposure target to the mark position detection part, controls the stage part according to distance information calculated in the mark position detection part and performs the position adjustment of the exposure target. The exposure apparatus is able to transfer the mask to the center of the exposure target and is able to accurately adjust position between the mask and exposure target. [Reference numerals] (610) Camera part; (620) Camera movement part; (630) Mark position detection part; (640) Memory part; (650) Control part</p>
申请公布号 KR20140047422(A) 申请公布日期 2014.04.22
申请号 KR20120113711 申请日期 2012.10.12
申请人 OPTIRAY. CO. KR 发明人 KIM, SEONG BONG;KIM, SUNG GU
分类号 G03F7/20;G03F7/207;H01L21/027 主分类号 G03F7/20
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