| 摘要 |
PROBLEM TO BE SOLVED: To provide a fullerene derivative having both of an acid decomposable substituent and a leaving substituent having reactivity with a hydroxyl group or the like, which is useful for an electronic material, a photoresist material, a resin additive, a physiological active substance or the like.SOLUTION: The fullerene derivative includes a substituent (D) having an acid dissociable partial structure and a leaving substituent, or includes a leaving substituent (L) and a substituent (A) having an acid dissociable partial structure. (A fullerene skeleton of the fullerene derivative may include any substituent other than the substituent (D), or the substituent (A) and the leaving substituent (L)). The acid dissociable partial structure is preferably an acetal type partial structure and/or an ester type partial structure. The leaving substituent (L) is a halogen atom, -O-SO-R, or -O-R(where Rrepresents an alkyl or haloalkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 20 carbon atoms). |
