| 摘要 |
PROBLEM TO BE SOLVED: To form a stable vapor deposition pattern on a substrate by keeping temperature of a mask during vapor deposition constant with a simple mechanism in a vapor deposition device.SOLUTION: In a vapor deposition device, a vapor deposition source is heated to evaporate an evaporation material, and a mask defining a vapor deposition pattern on a substrate is brought into contact with the substrate, so as to form a thin film on the substrate. The vapor deposition device has a heating plate contacting the mask, and a pipeline that passes inside the vapor deposition source and the heating plate, and in which a cooling medium flows. Then, the cooling medium is heated by heat of the vapor deposition source, so that the heated cooling medium flows in the heating plate. Also, the vapor deposition device is provided with heating means different from the vapor deposition source, and the pipeline may pass inside the heating means and the heating plate. |
