发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF |
摘要 |
An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having an alcoholic hydroxyl group; an epoxy resin (B) having two or more epoxy groups in a molecule; and a photoacid generator (C), wherein the addition ratio the monocarboxylic acid compound (b) with respect to 1 equivalent of the epoxy group of the epoxy resin (a) is 80 equivalent % or more, and the addition ratio the polybasic anhydride with respect to one equivalent of the primary hydroxyl group of the reactant (ab) is 80 equivalent % or more. |
申请公布号 |
KR20140047098(A) |
申请公布日期 |
2014.04.21 |
申请号 |
KR20147002301 |
申请日期 |
2012.07.26 |
申请人 |
NIPPON KAYAKU KABUSHIKI KAISHA |
发明人 |
OONISHI MISATO;INAGAKI SHINYA;IMAIZUMI NAOKO;HONDA NAO |
分类号 |
G03F7/004;G03F7/032;G03F7/11 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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