半导体装置及其制造方法,申请号TW097116499-传众专利搜索

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发明名称	半导体装置及其制造方法
摘要
申请公布号	TWI435411	申请公布日期	2014.04.21
申请号	TW097116499	申请日期	2008.05.05
申请人	瑞萨电子股份有限公司日本	发明人	寺田雄佑;丰川滋也;前田敦
分类号	H01L21/768;H01L21/76;G02F1/1368	主分类号	H01L21/768
代理机构		代理人	陈长文台北市松山区敦化北路201号7楼
主权项
地址	日本

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