| 摘要 |
PROBLEM TO BE SOLVED: To provide an acrylate-based polymer which has narrow distributions of compositions and molecular weights and is excellent in resolution when used as a photoresist.SOLUTION: A polymer is produced using: unsaturated monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, a photoacid-generating monomer, or a combination comprising at least one of said monomers; anda dithioester compound represented in a simplified form by the specified formula (I) as a chain transfer agent for reversible addition fragmentation transfer polymerization (RAFT). (in the formula (I), Z is a y-valent Corganic group, L is a heteroatom or a single bond, and y is an integer between 1 and 6.) Also disclosed are a photoresist composition comprising the polymer, a coated substrate comprising a layer of the composition, and a method of forming an electronic device from the photoresist. |
