| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate manufacturing method which is unlikely to cause an irregularity on a surface of a thin film.SOLUTION: A substrate manufacturing method comprises: (a) coating a photocurable liquid thin film material on a surface of a substrate in a first region and inhibiting flowing of the thin film material coated on the first region to a neighboring second region across a border line by a flow inhibition structure; (b) coating a liquid thin film material on the second region in a state where flow of the thin film material in the first region to the second region is inhibited by the flow inhibition structure; and (c) curing at least a surface part of the thin film material coated on the first region and the second region by light irradiation. |
