| 摘要 |
PROBLEM TO BE SOLVED: To measure a film thickness directly and accurately in a deposition process in a deposition device for forming a film on a surface of a film substrate using a roll-to-roll method.SOLUTION: The deposition device includes an unwinding section 2, a deposition section 3, a film thickness measurement section 4, and a winding section 5. The unwinding section 2 includes an unwinding roll 11, and a film substrate 8 is unwound from the unwinding roll 11. The deposition section 3 forms a film on a surface of the film substrate 8 unwound from the unwinding roll 11. The film thickness measurement section 4 radiates pump light and probe light to the film formed on the surface of the film substrate 8, measures the intensity of the reflected light produced by reflection of the radiated probe light, and measures the film thickness of the film on the basis of the measured intensity. The winding section 5 includes a winding roll 14, and winds, on the winding roll 14, the film substrate 8 whose film thickness is measured by the film thickness measurement section 4. |
