发明名称 Compound, resin and photoresist composition
摘要 The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more—CH2—in the C2-C36 heterocyclic group can be replaced by—CO—or—O—, R2 is independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.
申请公布号 US8697882(B2) 申请公布日期 2014.04.15
申请号 US201113175072 申请日期 2011.07.01
申请人 KIM HYUNGJOO;KAMABUCHI AKIRA;MUKAI YUICHI;SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 KIM HYUNGJOO;KAMABUCHI AKIRA;MUKAI YUICHI
分类号 C07D291/00;C07C317/30;C07D275/02;C07D275/04;C07D275/06;C07D291/02 主分类号 C07D291/00
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