| 摘要 |
A magnetron sputtering target includes a plurality of target materials attached to a copper plate and connected to negative voltage, a driving device, and a cell grid magnetron device fixed to a rear portion of the copper plate and including a substrate, a cell-grid magnetic disc, and a plurality of magnetic stripes. The cell-grid magnetic disc and the magnetic stripes are inwardly directed and fixed on the substrate. The substrate is driven by the driving device to perform a plane track motion at a predetermined speed in the range of the target material. The cell-grid magnetic disc includes magnetic stripes mutually connected to each other. The same first poles are directed to the target material, and the magnetic stripes are distributed in the grid of the cell-grid magnetic disc. In the ring-shape magnetic disc and the magnetic stripes, which are placed at the outermost places, the same second poles are directed toward the target material. In addition, the substrate is additionally provided at the outside thereof with an independent ring-shape magnetic disc, and the independent ring-shape magnetic disc is stationary. |
