| 摘要 |
PURPOSE: A substrate processing apparatus and a method for cleaning a head are provided to omit a vacuum pump, thereby reducing maintenance costs. CONSTITUTION: A body(1010) includes an inlet(1011) and a space(U). The liquid flowing out a head member moves from the inlet to the space. Gas supplied from a gas source(1053) is supplied to a suction hole(1013) through the gas supply pipe(1051) of a suction member(1050). A guide plate(1016) guides the gas. An outlet(1005) discharges the gas. |
