发明名称 Charged particle beam inspection method
摘要 An imaging method and apparatus for forming images of substantially the same area on a sample for defect inspection within the area are disclosed. The disclosed method includes line-scanning the charged particle beam over the area to form a plurality of n*Y scan lines by repeatedly forming a group of n scan lines for Y times. During the formation of each group of n scan lines, an optical beam is, from one line scan to another, selectively illuminated on the area prior to or simultaneously with scanning of the charged particle beam. In addition, during the formation of each group of n scan lines, a condition of illumination of the optical beam selectively changes from one line scan to another. The conditions at which individual n scan lines are formed are repeated for the formation of all Y groups of scan lines.
申请公布号 US8692214(B2) 申请公布日期 2014.04.08
申请号 US20090540357 申请日期 2009.08.12
申请人 ZHAO YAN;JAU JACK;HERMES MICROVISION, INC. 发明人 ZHAO YAN;JAU JACK
分类号 G21G5/00 主分类号 G21G5/00
代理机构 代理人
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