Charging material needs to be distributed evenly in an enclosure 30 in form of a furnace or reactor to ensure its best operation. To this end a charging material distribution inside the enclosure 30 of the furnace is used which has a movable charging means 4 in form of a spout through which the charging material is fed into the enclosure 30. The distribution device according the present invention is small in size and light in weight and has a moveable charging means 4 in form of a spout which is suspended on a gimbal suspension 2 on a fixed charging means in form of a chute 3 inside the enclosure 30.
申请公布号
CA2589314(C)
申请公布日期
2014.04.08
申请号
CA20052589314
申请日期
2005.11.16
申请人
SIEMENS VAI METALS TECHNOLOGIES LTD.;SIEMENS VAI METALS TECHNOLOGIES GMBH & CO
发明人
FLETCHER, JEREMY;KIBBLE, BRIAN;SPRENGER, HARALD;WIEDER, KURT;WURM, JOHANN