| 摘要 |
The present invention relates to an antistatic release film having an excellent solvent resistance, and a manufacturing method thereof. The antistatic release film with an excellent solvent resistance of the present invention is a polyester silicone release film with excellent antistatic characteristics, while being characterized by a formation of a silicone release layer coated in a given coating thickness with a silicone release liquid composed of a solvent containing no more than 5 wt% of solid content propenyl or iso-propenyl polysiloxane that contains hydroxyl group and propenyl group or iso-propenyl group, less than 1 wt% of hydrogen polysiloxane, less than 0.5 wt% of a peeling force modifier, and less than 0.01 wt% of a platinum catalyst. The antistatic release film with an excellent solvent resistance of the present invention composed as above is not only excellent in release but also capable of remarkably reducing an attachment of dust or foreign objects onto polyester films due to having antistatic characteristics, thereby being used effectively for an MLCC release carrier as a high functional release film and a polarizer release, a polarizer protective separator, a medical release, an electrical/electronic, a display protective separator, etc.; and an active utilization is possible particularly for protective separators by manifesting an excellent friction resistance and solvent resistance. [Reference numerals] (AA) Release coating layer; (BB) Antistatic coating |
