| 摘要 |
The present invention provides a film forming device capable of forming a film having a high exchanging property with a reactive gas and replacement gas and having excellent in-plane uniformity. In a film forming device performing a film forming process by supplying multiple types of reactive gases, which are reacting with each other, in a regular sequence for a substrate (W) in a processing chamber in a vacuum atmosphere, a ceiling part (31) facing a mounting part (2) where the substrate is mounted has the structure of an inclination surface being wider from the center to the circumference. Multiple gas discharging holes (42) are formed along a peripheral direction at multiple gas supplying parts (4) formed at the center part of the ceiling part (31). A shower head (5) covering the gas supplying parts (4) at a lower side supplies gas to the substrate (W) in the form of shower via the gas supplying parts. The outer body of the shower head (5) is positioned at a side closer to the inside than the outer body of the substrate (W) mounted at the mounting part (2). |
