发明名称 INSULATED GATE TRANSISTOR AND METHOD OF PRODUCTION THEREOF
摘要 <p>An IGBT has layers between emitter and collector sides. The layers include a drift layer, a base layer electrically contacting an emitter electrode and separated from the drift layer, a first source region arranged on the base layer towards the emitter side and electrically contacting the emitter electrode, and a first trench gate electrode arranged lateral to the base layer and separated from the base layer, the first source region and the drift layer by a first insulating layer. A channel exits between the emitter electrode, the first source region, the base layer and the drift layer. A second insulating layer is arranged on top of the first trench gate electrode. An enhancement layer separates the base layer from the drift layer in a plane parallel to the emitter side. A grounded gate electrode includes a second, grounded trench gate electrode and an electrically conducting layer.</p>
申请公布号 KR20140042858(A) 申请公布日期 2014.04.07
申请号 KR20147001042 申请日期 2012.07.06
申请人 ABB TECHNOLOGY AG 发明人 RAHIMO MUNAF;ANDENNA MAXI;CORVASCE CHIARA;KOPTA ARNOST
分类号 H01L29/739;H01L21/331 主分类号 H01L29/739
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