METHOD FOR MANUFACTURING SUBSTRATE FOR MASK BLANK, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND INSPECTING APPARATUS

摘要

PROBLEM TO BE SOLVED: To appropriately inspect the presence or absence of a defect in a light-transmitting substrate with high accuracy in a method for manufacturing a substrate for a mask blank.SOLUTION: A method for manufacturing a substrate for a mask blank is provided, including the following inspection step. In the inspection step, a light-transmitting substrate 10 one major surface of which is optically connected to an optical member 102 via a liquid, is irradiated with inspection light via the optical member 102 in a direction where the inspection light is totally reflected on an inspection position 302 of the other major surface; and the presence or absence of inspection light leaking through a position other than a predicted exiting position of the optical member 102 is detected. The inspection step is carried out by: irradiating the substrate with inspection light in a first direction to induce total reflection at the inspection position 302; introducing the light totally reflected at the inspection position 302 into the optical member 102; reflecting the introduced light in the optical member to allow the light to propagate in a second direction that is different from the first direction and which induces total reflection on the inspection position 302; and again irradiating the substrate at the inspection position 302 with the inspection light in the second direction.