SELF-ORGANIZING COMPOSITION FOR FORMING PATTERN, METHOD FOR FORMING PATTERN BY SELF-ORGANIZATION OF BLOCK COPOLYMER USING SAME, AND PATTERN

摘要

Provided are: a self-organizing composition for forming a pattern, which is capable of improving the throughput of pattern formation by remarkably reducing the annealing time required for microphase separation in self-organization lithography using a block copolymer; a method for forming a pattern by self-organization of a block copolymer with use of the self-organizing composition; and a pattern. A self-organizing composition for forming a pattern, which contains an organic solvent and a block copolymer that contains a block having a repeating unit represented by general formula (1). In general formula (1), X represents an alkyl group or a cycloalkyl group, and n represents an integer of 1-5. In cases where n is 2 or more, the plurality of X moieties may be the same as or different from each other.