SUBSTRATE PROCESSING APPARATUS

摘要

The present invention provides a substrate processing device which is capable of effectively processing a large thin substrate and a deposition device with the same. To achieve this, the substrate processing device comprises a chamber body with an opening on one side to allow a substrate to access; and a plurality of substrate pins which can be arranged on the chamber body and which include a substrate pin to support the edge of the one tip end of a substrate around the opening, supplied through the opening.