EXPOSURE/RENDERING DEVICE, EXPOSURE/RENDERING SYSTEM, PROGRAM, AND EXPOSURE/RENDERING METHOD

摘要

Provided are: an exposure/rendering device that, when rendering an image at both surfaces of a substrate to be exposed, can prevent the rendering of images that do not correspond with each other at each surface; an exposure/rendering system; a program; and an exposure/rendering method. By means of exposing a first surface on the basis of first job information (60A) in which are associated exposure condition information and image information indicating the image to render to the first surface of the substrate to be exposed, the image indicated by the first job information (60A) is rendered to the first surface; a plurality of second job information (60B) is recorded in each of which are associated exposure condition information and image information indicating the image to render to the second surface of the substrate to be exposed; and on the basis of second job information (60B) in the plurality of second job information (60A) and having exposure condition information identical to the exposure condition information indicated by the first job information (60A) used in rendering the image to the first surface, the image indicated by the second job information is rendered to the second surface by exposing the second surface of the substrate to be exposed, to the first surface of which the image has been rendered.