发明名称 |
OPTICAL RULE CHECKING FOR DETECTING AT RISK STRUCTURES FOR OVERLAY ISSUES |
摘要 |
A method and system is provided for detecting at risk structures due to mask overlay that occur during lithography processes. The method can be implemented in a computer infrastructure having computer executable code tangibly embodied on a computer readable storage medium having programming instructions. The programming instructions are operable to obtain a simulation of a metal layer and a via, and determine a probability that an arbitrary point (x, y) on the metal layer is covered by the via by calculating a statistical coverage area metric followed by mathematical approximations of a summing function. |
申请公布号 |
US2014095124(A1) |
申请公布日期 |
2014.04.03 |
申请号 |
US201213630098 |
申请日期 |
2012.09.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORP;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BANERJEE SHAYAK;BREARLEY WILLIAM |
分类号 |
G06F17/00 |
主分类号 |
G06F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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