发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A compound semiconductor device includes: a compound semiconductor layer; and a gate electrode formed above the compound semiconductor layer; and a source electrode and a drain electrode formed on both sides of the gate electrode, on the compound semiconductor layer, wherein the source electrode has a plurality of bottom surfaces along transit electrons out of contact surfaces with the compound semiconductor layer, and the plural bottom surfaces are located at different distances from the transit electrons, with the bottom surface closer to the gate electrode being more apart from the transit electrons.
申请公布号 US2014091365(A1) 申请公布日期 2014.04.03
申请号 US201314032493 申请日期 2013.09.20
申请人 FUJITSU LIMITED;FUJITSU SEMICONDUCTOR LIMITED 发明人 KIKKAWA TOSHIHIDE;NUKUI KENJI
分类号 H01L29/778;H01L29/66 主分类号 H01L29/778
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