| 摘要 |
<p>The purpose of the present invention is to provide a copolymer composition which has good sensitivity and developability, and which is capable of providing a cured coating film that has excellent thermal decomposition resistance, thermal yellowing resistance and solvent resistance. In order to achieve the above-mentioned purpose, the present invention provides: an alkali developable resin composition that contains (A) a copolymer which is synthesized using a glycidyl (meth)acrylate, comprises no acid group, and has a weight average molecular weight of 1,000-50,000 in terms of polystyrene, and (B) a copolymer which comprises an acid group and has a weight average molecular weight of 1,000-50,000 in terms of polystyrene; and a resin composition, a photosensitive resin composition and the like, each of which contains this copolymer composition.</p> |
