| 发明名称 |
Salt, photoresist composition and process for producing photoresist pattern |
| 摘要 |
A salt represented by the formula (I): wherein Q1, Q2, L1, L2, ring W, s, t, R1, R2 and Z+ are defined in the specification. |
| 申请公布号 |
US8685617(B2) |
申请公布日期 |
2014.04.01 |
| 申请号 |
US201113333521 |
申请日期 |
2011.12.21 |
| 申请人 |
ICHIKAWA KOJI;YOSHIDA ISAO;SUZUKI YUKI;SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
ICHIKAWA KOJI;YOSHIDA ISAO;SUZUKI YUKI |
| 分类号 |
G03F7/004;C07C309/02;C07C309/04;C07C309/06;G03F7/028 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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