发明名称 Memory device and method for manufacturing the same
摘要 According to one embodiment, a memory device includes a nanomaterial assembly layer, a first electrode layer and a second electrode layer. The nanomaterial assembly layer is formed of an assembly of a plurality of micro conductors via gaps between the micro conductors. The first electrode layer is provided on the nanomaterial assembly layer. The second electrode layer is provided on the first electrode layer.
申请公布号 US8686384(B2) 申请公布日期 2014.04.01
申请号 US201113052426 申请日期 2011.03.21
申请人 A{DOT OVER (O)}YAMA KENJI;YAMAMOTO KAZUHIKO;ISHIKAWA SATOSHI;OSHINO SHIGETO;KABUSHIKI KAISHA TOSHIBA 发明人 A{DOT OVER (O)}YAMA KENJI;YAMAMOTO KAZUHIKO;ISHIKAWA SATOSHI;OSHINO SHIGETO
分类号 H01L21/00 主分类号 H01L21/00
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