发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 Realized is a compound semiconductor device which has a high withstand voltage and reliability by realizing a normaly off by obtaining a voltage of a large threshold value without a relatively simple composition, a withstand voltage deterioration and an operation instability. The compound semiconductor device includes a firs layer (3), a second layer (4) which is formed on the first layer and has a band gap which is greater than the first layer (3), a third layer (5a) which is formed on the second layer and has a p type conductivity, a gate electrode (11) which is formed by forming the second layer on the third layer (5a), a forth layer (6) which touches the third layer (5a) and has a band gap which is greater than the forth layer (6), and a fifth layer (7) which touches the third layer (5a) on the fourth layer (6) and has a band gap which is lower than the fourth layer (6).
申请公布号 KR20140038873(A) 申请公布日期 2014.03.31
申请号 KR20130088547 申请日期 2013.07.26
申请人 FUJITSU LIMITED 发明人 NISHIMORI MASATO;IMADA TADAHIRO;OHKI TOSHIHIRO
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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