| 摘要 |
A purifying device for eliminating xenobiotics in concentrations of micro to femtogram per litre from water on industrial scale comprises a photochemical reactor unit 2 that has an inlet 2’for contaminated water and an outlet 2”for purified water and provides a flow path for continuously flowing water from the inlet 2’to the outlet 2”. The device is equipped with at least one radiation source module 6 that provides ultraviolet radiation in a wavelength range ranging from 100 to 280 nm, at least one membrane filtration unit 1 comprising a hydrophilic membrane 5 having pore sizes ranging from 0.07 µm to 0.25 µm with a mean pore size of 0.12 µm designed to perform filtration between micro and ultra-filtration and connected upstream of the photochemical reactor unit 2 via the inlet 2’and at least one device for supplying air or dioxygen to the water in the photochemical reactor unit 2, and at least one device for feeding hydrogen peroxide to the photochemical reactor unit 2, and one or more water flux and/or level regulating systems. The radiation source module 6 comprises a radiation source and an enveloping tube enveloping the radiation source. The tube is partially transparent for ultraviolet radiation in the wavelength range from 100 to 280 nm, and is made of synthetic quartz material. |
