| 摘要 |
PROBLEM TO BE SOLVED: To provide a catadioptric projection optical system having a large numerical aperture without enlarging an optical member, an exposure device and an exposure method that employ a liquid immersion method.SOLUTION: A catadioptric projection optical system PL1 forming a contraction image of a pattern of a first plane R1 on a second plane comprises: a first imaging optical system G1 that is composed of a first optical system G11 and a second optical system including at least six mirrors M1 to M6 and forms a first intermediate image and a second intermediate image; and a second imaging optical system G2 that relays the second intermediate image onto the second plane. |
