发明名称 |
Film Deposition Apparatus and Film Deposition Method |
摘要 |
A film deposition apparatus includes: a chamber including a chamber wall that is formed with a window; a target holder disposed in the chamber for supporting a target; a radio frequency power device; a pole plate unit disposed in the chamber and including a first pole plate that is electrically connected to the radio frequency power device, and a second pole plate for supporting the substrate, the first and second pole plates being disposed at two opposite sides of the target holder; a vacuum device to extract air from the chamber; and a pulsed laser device to generate a laser beam capable of bombarding the target through the window. |
申请公布号 |
US2014083840(A1) |
申请公布日期 |
2014.03.27 |
申请号 |
US201213614002 |
申请日期 |
2012.09.13 |
申请人 |
HSIAO KUEI-SEN;CHOU YU-CHUEH;HUANG SHIH-HAO;NATIONAL CHI NAN UNIVERSITY |
发明人 |
HSIAO KUEI-SEN;CHOU YU-CHUEH;HUANG SHIH-HAO |
分类号 |
C23C14/46 |
主分类号 |
C23C14/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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