发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a non-volatile memory device that allows stably holding charges in memory cells and improving operating speed, and to provide a method of manufacturing the same.SOLUTION: A non-volatile memory device includes memory cells each having a semiconductor layer, a charge storage layer provided on the semiconductor layer, and a first insulating film insulating between the semiconductor layer and the charge storage layer. The non-volatile memory device further includes a first conductive layer provided on the charge storage layer and controlling charges in the charge storage layer, a second conductive layer provided between the charge storage layer and the first conductive layer, a second insulating film insulating between the charge storage layer and the second conductive layer, and a third insulating film insulating between the first conductive layer and the second conductive layer.
申请公布号 JP2014056900(A) 申请公布日期 2014.03.27
申请号 JP20120199940 申请日期 2012.09.11
申请人 TOSHIBA CORP 发明人 SAOTOME SHINICHI;YAMADA KENTA
分类号 H01L21/8247;H01L21/336;H01L27/10;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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