| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing system which improve throughput of a series of substrate processing including exposure processing.SOLUTION: A substrate processing apparatus 500 includes a processing part 100 and an exposure transfer part 200. The exposure transfer part 200 includes a horizontal transfer region 201 and multiple vertical transfer regions 202 in a housing 200a. The horizontal transfer region 201 is provided at an upper part in the housing 200a so as to extend in an X direction. Multiple exposure devices EXP are disposed below the horizontal transfer region 201 so as to be arranged along the X direction. Transfer mechanisms 203a, 203b are provided at the horizontal transfer region 201. The transfer mechanisms 203a, 203b are formed so as to transfer substrates between the processing part 100 and the multiple exposure devices EXP. |
