| 摘要 |
<p>Disclosed are a polysilicon fragmenting method and device, the method comprising the following steps: placing the polysilicon in a pool; and applying a high transient voltage to the pool to cause a high-voltage discharge by the water in the pool so as to fragment the polysilicon. The device comprises a high voltage transformer (B), a high voltage rectifier (G), a charging capacitor (C), an isolation interval switch (K), a pool (F), and a first electrode (1) and a second electrode (2) both immersed in the pool (F); the primary winding of the high voltage transformer (B) is connected to commercial power; the first connecting terminal of the secondary winding is connected to the high voltage rectifier (G), the isolation interval switch (K) and the first electrode (1) sequentially; the second connecting terminal of the secondary winding is grounded, and is connected to the second electrode (2); the charging capacitor (C) is connected between the common terminal of the high voltage rectifier (G) and the isolation interval switch (K) and the common terminal of the second winding and the second electrode (2). The polysilicon fragmenting method and device have a simple process and no metal pollution, and provide uniform fragmenting.</p> |
