发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive composition that allows formation of a cured product excellent in release property from a mold, adhesiveness to a plastic substrate and transparency.SOLUTION: The photosensitive composition comprises the following components (1) to (4): (1) a radical initiator (A), (2) an acid generator (B) and/or a base generator (C), (3) a polymerizable substance (D), and (4) a salt (G) comprising a phosphate (a) having a specified composition and a tertiary amine (b). In the composition, at least one of the radical initiator (A), the acid generator (C) and the base generator (C) generates an active species (H) by irradiation with active rays; (H) reacts with (A), (B) or (C) to generate a new active species (I), and (I) promotes a polymerization reaction of the polymerizable substance (D). (H) or (I) is an acid or base. (D) contains a UV-curable resin (D1) having a specified molecular weight and a (meth)acrylate (D2) having a specified molecular weight. The photosensitive composition does not substantially contain any of a colorant, a metal oxide powder and a metal powder.
申请公布号 JP2014055241(A) 申请公布日期 2014.03.27
申请号 JP20120201022 申请日期 2012.09.12
申请人 SANYO CHEM IND LTD 发明人 YAMAGUCHI ATSUSHI
分类号 C08F2/50;C08F290/00;H01L21/027 主分类号 C08F2/50
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