| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for cured film formation, being stable under room temperature conditions, and allowing generation of a base by heating at 150°C to 200°C and formation of a cured film excellent in surface hardness and solvent resistance.SOLUTION: A compound is represented by the formula (1). (In the formula (1), Rand Reach independently represents an alkyl group having a carbon number of 1 to 12, an alkoxyl group having a carbon number of 1 to 12, a halogen, a cyano group or a nitro group. n represents an integer of 0-4, m represents an integer of 0-5, and Xrepresents an onium ion.) |
