发明名称 APPARATUS FDR TREATING SUBSTRATES
摘要 The present invention relates to an apparatus for manufacturing a substrate and, more particularly, to an apparatus for discharging liquid drops such as liquid crystal, polyimide (PI), and a color filter (CF) on a substrate by an inkjet method. According to an embodiment of the present invention, the apparatus for processing a substrate comprises: a substrate supporting member which supports a substrate; a head unit including one or more heads which spray a processing liquid to the substrate supported by the substrate supporting member; and a processing liquid supply unit which stores the processing liquid supplied to the head. The processing liquid supply unit comprises: a storage tank which stores the processing liquid; a control unit which pressurized the inside of the storage tank; a pressure control line which is connected with the top surface of the storage tank; and a level regulating member which is separated from the inlet of the pressure control line, and is provided by being overlapped with the inlet of the pressure control line when seen from the upper part of the storage tank.
申请公布号 KR20140036786(A) 申请公布日期 2014.03.26
申请号 KR20120103338 申请日期 2012.09.18
申请人 SEMES CO., LTD. 发明人 PARK, TAE HYUN
分类号 B41J2/01;B41J2/045 主分类号 B41J2/01
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