发明名称 System and method for high accuracy gas inject in a two chamber gas discharge laser system
摘要 Systems and methods for automatically performing a high accuracy gas inject in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. A mathematical model relates the amount of halogen gas in the laser chamber after an inject to the amount of halogen gas present prior to the inject, the amount of halogen gas injected, and the consumption rate of halogen gas in the chamber. A fixed amount of halogen gas is added to the chamber in an initial number of injects to allow transients to settle out, after which the amount of halogen gas to be injected is that calculated to result in a desired amount of halogen gas after the inject according to the model. Measurements are taken after injects to update the actual amount of halogen gas present and the consumption rate of the halogen gas.
申请公布号 US8681832(B2) 申请公布日期 2014.03.25
申请号 US201113251181 申请日期 2011.09.30
申请人 RIGGS DANIEL J.;CYMER, INC. 发明人 RIGGS DANIEL J.
分类号 H01S3/22 主分类号 H01S3/22
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