| 摘要 |
The purpose of the present invention is to provide a charged-particle-beam device capable of measuring aberration even when a significant amount of aberration remains. A charged-particle-beam device equipped with a charged-particle-beam source (1), a charged-particle optical system for irradiating a specimen (10) with charged particles emitted from the charged-particle-beam source (1), an aberration corrector (6) for correcting the aberration in the charged-particle optical system, and a control unit (26) for controlling the charged-particle optical system and the aberration corrector (6), the charged-particle-beam device being further equipped with a through-focus imaging unit (18) for obtaining a plurality of ronchigrams in which the focal-point position in the charged-particle optical system has been changed, and aberration calculation units (21-22) for dividing the obtained ronchigrams into a plurality of local areas, and calculating the amount of aberration on the basis of the line focus detected in the local areas. |
