发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
摘要 A semiconductor device includes an element region and an end region, the element region having a semiconductor element formed therein, and the end region surrounding the element region. The semiconductor device includes a semiconductor substrate, a trench, an insulating layer, and a field plate conductive layer. The trench is formed in the semiconductor substrate so as to surround the element region in the end region. The field plate conductive layer is formed in the trench via the insulating layer.
申请公布号 US2014077254(A1) 申请公布日期 2014.03.20
申请号 US201313780246 申请日期 2013.02.28
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 IZUMISAWA MASARU;ONO SYOTARO;OHTA HIROSHI;YAMASHITA HIROAKI
分类号 H01L29/06;H01L21/48;H01L29/739 主分类号 H01L29/06
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