发明名称 |
DESIGN OF TARGET CAPABLE OF INCREASING COOLING CAPABILITY AND DECREASING DEFLECTION AND DEFORMATION AND RELATED METHODS FOR THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target having increased cooling capability and being capable of decreasing deflection and deformation of a sputtering material.SOLUTION: The sputtering target comprises: a) a target surface element; b) a core backing element having a connecting surface connected to the target surface element; and c) at least one surface area shape increasing the effective surface area of the core backing element. An additive sputtering target comprises: a) an integrated target surface element and a core backing element, in which a target surface element and a core backing element have the same target material or material gradient; and b) at least one surface area shape. A method for forming a sputtering target comprises: a) providing a target surface element; b) providing a core backing element; c) providing at least one surface area shape increasing the effective surface area of a core backing plate; and d) connecting a surface target material to the connecting surface of a core backing material. |
申请公布号 |
JP2014051746(A) |
申请公布日期 |
2014.03.20 |
申请号 |
JP20130256698 |
申请日期 |
2013.12.12 |
申请人 |
HONEYWELL INTERNATL INC |
发明人 |
STROTHERS SUSAN;HORT WERNER;MCNEIL FREDERICK |
分类号 |
C23C14/34;B22F3/15;B23K20/14;B23K20/16;B29C67/00;C23C;C23C14/35;H01L21/285 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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