发明名称 DESIGN OF TARGET CAPABLE OF INCREASING COOLING CAPABILITY AND DECREASING DEFLECTION AND DEFORMATION AND RELATED METHODS FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target having increased cooling capability and being capable of decreasing deflection and deformation of a sputtering material.SOLUTION: The sputtering target comprises: a) a target surface element; b) a core backing element having a connecting surface connected to the target surface element; and c) at least one surface area shape increasing the effective surface area of the core backing element. An additive sputtering target comprises: a) an integrated target surface element and a core backing element, in which a target surface element and a core backing element have the same target material or material gradient; and b) at least one surface area shape. A method for forming a sputtering target comprises: a) providing a target surface element; b) providing a core backing element; c) providing at least one surface area shape increasing the effective surface area of a core backing plate; and d) connecting a surface target material to the connecting surface of a core backing material.
申请公布号 JP2014051746(A) 申请公布日期 2014.03.20
申请号 JP20130256698 申请日期 2013.12.12
申请人 HONEYWELL INTERNATL INC 发明人 STROTHERS SUSAN;HORT WERNER;MCNEIL FREDERICK
分类号 C23C14/34;B22F3/15;B23K20/14;B23K20/16;B29C67/00;C23C;C23C14/35;H01L21/285 主分类号 C23C14/34
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