发明名称 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE
摘要 An imaging optical system has a plurality of mirrors, which via a beam path for imaging light, image an object field in an object plane into an image field in an image plane. The imaging optical system has an exit pupil obscuration. At least one of the mirrors has no opening for passage of the imaging light. The fourth to last mirror in the beam path is concave, resulting in an imaging optical system having improved imaging properties without compromise in throughput.
申请公布号 US2014078484(A1) 申请公布日期 2014.03.20
申请号 US201314085614 申请日期 2013.11.20
申请人 CARL ZEISS SMT GMBH 发明人 MANN HANS-JUERGEN;SHAFER DAVID
分类号 G03F7/20;G02B17/06 主分类号 G03F7/20
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