| 摘要 |
<p>A pupil luminance distribution is set so that a process window arrives at a predetermined value or higher while a mask error enhancement factor (MEEF) is kept low. A method for setting a pupil luminance distribution to be formed on an illumination pupil of an illumination optical system for supplying illuminating light to an image-forming optical system that forms an image of a pattern disposed on a first surface on a second surface. The method comprises: calculating a process window using a predetermined pattern disposed on a first surface and a pupil luminance distribution expressed by a plurality of luminance factors two-dimensionally distributed along the illumination pupil; and setting the pupil luminance so that the process window arrives at a predetermined value or higher with the allowable MEEF acting as a limiting condition.</p> |
