A pellicle for lithography

摘要

A pellicle (10) for lithography includes a pellicle frame (3), a pellicle membrane (1) adhered onto the upper end surface of the pellicle frame (3) and an agglutinant layer (4) formed on the lower surface of the pellicle frame (3) and the agglutinant layer (4) is formed by hardening a curable composition containing a straight chain perfluoro compound having a perfluoro structure in a main chain. The thus constituted pellicle (10) generates only a small amount of a decomposition gas even when it is used for a long time, thereby preventing solid-like foreign materials from separating out on a pattern region of a photomask (5) and can suppress degradation of the agglutinant agent contained in an agglutinant layer (4) to be used for fixing a photomask (5) to the pellicle frame (3). Further, this pellicle (10) can be easily peeled off from a photomask (5) and replaced with a new one.