发明名称 Gallium-nitride-on-diamond wafers and devices, and methods of manufacture
摘要 Methods for integrating wide-gap semiconductors, and specifically, gallium nitride epilayers with synthetic diamond substrates are disclosed. Diamond substrates are created by depositing synthetic diamond onto a nucleating layer deposited or formed on a layered structure that comprises at least one layer made out of gallium nitride. Methods for manufacturing GaN-on-diamond wafers with low bow and high crystalline quality are disclosed along with preferred choices for manufacturing GaN-on-diamond wafers and chips tailored to specific applications.
申请公布号 US8674405(B1) 申请公布日期 2014.03.18
申请号 US201213407588 申请日期 2012.02.28
申请人 BABIC DUBRAVKO;FAILI FIROOZ;FRANCIS DANIEL;DIDUCK QUENTIN;EJECKAM FELIX;ELEMENT SIX TECHNOLOGIES US CORPORATION 发明人 BABIC DUBRAVKO;FAILI FIROOZ;FRANCIS DANIEL;DIDUCK QUENTIN;EJECKAM FELIX
分类号 H01L29/20;H01L23/532 主分类号 H01L29/20
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