WAFER TRANSFER APPARATUS, POLISHING APPARATUS AND WAFER RECEIVING METHOD

摘要

A wafer transferring apparatus includes a top ring (60) for holding a wafer (W) on a lower end surface thereof and a pusher mechanism (10) for transferring the wafer (W) to and from the top ring (60). The pusher mechanism (10) has a wafer rest (40a) for placing the wafer (W) thereon and is arranged to allow the wafer (W) released from the lower end surface of the top ring (60) to be seated on the wafer rest (40a). The pusher mechanism (10) also has a sensor mechanism (50) for detecting when the wafer (W) is properly seated on the wafer rest (40a). The sensor mechanism (50) is adapted to block sensor light emitted from a light-emitting device (51) by the wafer (W) seated on the wafer rest (40a).