发明名称 |
INSULATING FILM AND METHOD OF PRODUCING INSULATING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide an insulating film and a method of producing the insulating film.SOLUTION: The present invention can remedy problems caused by occurrence of dents by providing the insulating film with a reinforcing layer having a weight ratio of silica of 60 to 80 wt.% on one surface thereof. |
申请公布号 |
JP2014046687(A) |
申请公布日期 |
2014.03.17 |
申请号 |
JP20130151427 |
申请日期 |
2013.07.22 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO LTD |
发明人 |
YI CHON-HEE;CHO JE-CHUN;JANG JONG YOON;CHUN HEE SUN;PARK JUNG SOO;KIM SUN-HYUN |
分类号 |
B32B7/02;B32B27/38;H05K1/03 |
主分类号 |
B32B7/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|