发明名称 Arrangement for determination of effector position or effector offset of mechanism, comprises radiation pattern positioning sensor attached to effector, where complete or partial position of effector is calculated by computing device
摘要 <p>The arrangement comprises a radiation pattern positioning sensor (7) attached to the effector (4), such that the acute angle between the sensor normal and the last joint axis of the robot (1) is greater than five degrees. The orientation of laser radiation pattern (2) is fixed relative to mechanism base. The images of the laser radiation patterns on the position sensors are directed to one or multiple computing devices, from which the partial or complete information about the position of the robot effector or its deviation from the given trajectory is determined. The complete or partial position of the effector is calculated by the computing device based on the measurements. An independent claim is included for a method for determining effector positions or effector offset using the arrangement.</p>
申请公布号 DE102012016073(A1) 申请公布日期 2014.03.13
申请号 DE20121016073 申请日期 2012.08.14
申请人 KUHNEN, NICOLAS 发明人 KUHNEN, NICOLAS
分类号 G01S5/16;G01B11/03;G01B11/14;G01B11/25;G01C11/00;G01S1/70;G01S3/78;G01S11/12 主分类号 G01S5/16
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